Optimization of Electron-Beam Evaporation Process Parameters for ZrN Thin Films by Plasma Treatment and Taguchi Method

This study presents the optimal process parameters of zirconium nitride (ZrN) thin films prepared by ion-assisted deposition (IAD) technology combined with electron-beam evaporation based on plasma surface treatment and Taguchi method. We use Minitab statistical software (Version 20.2.0) L9 orthogonal array parameter design response method (RSM). The quadratic polynomial regression equation was optimized RSM. Based control factor screening test method, we determined most critical combination for derived ZrN films. In coating experiments, successfully achieved good refractive index, adequate residual stress, lower roughness B270 glass substrates. These results indicate that preparation can simultaneously achieve several desirable properties, improving performance application Furthermore, our research not only reduces number experiments costs but also improves efficiency development. By key factors optimizing parameters, find best more rapidly, reduce demand expenses given materials equipment costs, contribute to process. According experimental results, it be observed under certain conditions, properties reached values. are highly useful provide a basis further improvement film properties.